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Equipment

Lithography/Patterning

Location

Heidelberg MLA150 Maskless Lithography System

Bay 4

Nanoscribe Photonics GT2 high-resolution 3D Printer Direct Laser Write Lithography

Bay 4

UpNano NanoOne 1000 2PP Printer

Bay 4

EVG 610 Double-sided Mask Aligner

Bay 4

BIDTEC SP100 Spin Coater

Bay 4

TESCAN MIRA3 E-beam Writer

Bay 4

Characterization

Location

Woollam Alpha-SE Spectroscopic Ellipsometer

Bay 1

Bruker DektakXT Profiler

Bay 1

Evident LEXT Scanning Microscope

Bay 1

Ocean Optics Film Measurement

Bay 1

Semiprobe Probe Station

Bay 1

Veeco 4 Point Probe

Bay 1

Leica Reichert Polylite 88 Optical Microscope

Bay 3

Caltex 3D Microscope

Bay 3

Nikon Eclipse LV150N Optical Microscope

Bay 4

FEI Helios NanoLab 460F1 DualBeam Focused Ion Beam (FIB)

Bay 4

Bonding/Dicing

Location

Disco Hi-Tec Dicing Saw

Bay 1

EVG 501 Wafer Bonder

Bay 1

MPP Dual Wire Bonder

Bay 1

Deposition/Diffusion

Location

Cressington Gold Sputter Coater

Bay 2

Bay 2

Lesker PVD 75 E-Beam Evaporator 1

Bay 2

Lesker PVD 75 E-Beam Evaporator 2

Bay 2

Oxford Plasmalab 80 PECVD

Bay 2

Lesker PVD 75 DC Sputter

Bay 2

Lesker PVD 75 RF Sputter

Bay 2

Minibrutes Oxidation/Anneal Furnace

Bay 2

MTI RTP Anneal Furnace

Bay 2

Allwin21 AccuThermo AW610M RTP

Bay 2

PDS 2010 Labcoter2 Parylene Deposition System

Bay 3

CLUSTEX 100sp Sputter

Bay 3

Plasma Etching

Location

Tegal Plasmaline 421 asher

Bay 2

Oxford Estrelas DRIE

Bay 3

Nordson March CS-1701 RIE

Bay 3

Oxford Plasmalab 100 ICP RIE

Bay 3

Rapid Prototyping

Location

PLS6.120D Laser Engraver

RP

Roland MDX-50 Benchtop CNC

RP

EnvisionTech 3D Printers

RP

Other Equipment

Location

Laurell Spin Coater

Bay 4

Baxter Drying Ovens

Bay 4

Hot Plate Vacuum Chamber

Bay 4

Bays 1 & 4