The MINIBRUTE Oxidation /Anneal Furnace is an atmospheric furnace which is used for dry and wet oxidation of silicon wafers.
Wafer size: 25-slot wafer carrier up to 3”
Gas cabinet: O2, N2, and steam generator available
Computer-controlled system
- Tube 1: up to 3-inch wafers, up to 1200C, and N2 and O2 available; this tube is generally used for metal anneals on Si and sintering processes.
- Tube 2: up to 3-inch wafers, up to 1200C, and N2, O2, and water bubbler are available; this tube is used for oxidation and Si/SiO2/SiNx only
- Tube 3: up to 4-inch wafers, up to 1200C with shield, and N2, O2, and water bubbler are available; this tube is used for oxidation and Si/SiO2/SiNx only
Link to MINIBRUTE Oxidation /Anneal Furnace SOP
Please use the iLab system to schedule time to use this equipment.
