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You are here: Home / Equipment / MINIBRUTE Oxidation/Anneal Furnace

MINIBRUTE Oxidation/Anneal Furnace

Minibrutes

The MINIBRUTE Oxidation /Anneal Furnace is an atmospheric furnace which is used for dry and wet oxidation of silicon wafers.

Wafer size: 25-slot wafer carrier up to 3”

Gas cabinet: O2, N2, and steam generator available

Computer-controlled system

  • Tube 1: up to 3-inch wafers, up to 1200C, and N2 and O2 available; this tube is generally used for metal anneals on Si and sintering processes.
  • Tube 2: up to 3-inch wafers, up to 1200C, and N2, O2, and water bubbler are available; this tube is used for oxidation and Si/SiO2/SiNx only
  • Tube 3: up to 4-inch wafers, up to 1200C with shield, and N2, O2, and water bubbler are available; this tube is used for oxidation and Si/SiO2/SiNx only

MINIBRUTE Oxidation /Anneal Furnace SOP

Please use the iLab system to schedule time to use this equipment.

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Minibrutes Oxidation/Anneal Furnace

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1617 Research Parkway
College Station, TX 77843

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Texas A&M University Department of Electrical and Computer Engineering
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