The MINIBRUTE Oxidation /Anneal Furnace is an atmospheric furnace which is used for dry and wet oxidation of silicon wafers.
Wafer size: 25-slot wafer carrier up to 3”
Gas cabinet: O2, N2, steam generator
Computer-controlled system
- Tube 1: up to 3-inch wafers, 1200C, N2, O2, generally used for metal anneals on Si, sintering, etc.
- Tube 2: up to 3-inch wafers, 1200C, N2, O2, water bubbler, oxidation, Si/SiO2/SiNx only
- Tube 3: up to 4-inch wafers, 1200C with shield, N2, O2, water bubbler, oxidation, Si/SiO2/SiNx only
Please use the iLab system to schedule time to use this equipment.
