The Clustex 100sp Sputtering is a sputtering system for substrates up to 4”. The substrate can be coated either by one magnetron or simultaneously by up to three magnetron sputtering heads.
Process chamber is equipped with 20 magnetrons arms
The magnetron arms consist of 16 RF and 3 DC sputtering, as well as an ion source.
Substrate temperature: up to 1000°C using a ceramic heater
Available gases: N2, Ar, O2
Approved Target Materials: SiO2, W, VO2, Nb2O5, Si, TiN, Al2O3, Ir, NbO2, HfO2, V, TiO2, Ru, V2O5, Hf, Ti, Al, Cu, MgO, SrTiO3
The approved materials list will change with time.