MTI D4
The Allwin21 AccuThermo AW610M is a rapid thermal annealing system for substrates of various sizes, especially focusing on temperature stability at relatively low temperature.
Sample Capability: 2″, 3″, 4″, 5″, 6″ wafers and small wafer pieces
Process/Purge Gas Inputs: Forming gas (5% H2 with N2) and Nitrogen (N2)
Steady State Temperature Range: 150°C – 1150°C (Max. 1250°C)
Ramp Up Rate: Programmable, 10 – 120°C/sec (Max. 200°C)
Ramp Down Rate: Non-programmable, 10 – 200°C/sec
Temperature Repeatability: ±0.5°C or better at 1150°C wafer-to-wafer
Temperature uniformity: ±5°C across a 6″ wafer at 1150°C
Dedicated for Non-Metal Processes
Allwin21 AccuThermo AW610M Standard Operating Procedure
Allwin21 AccuThermo AW610M Flyer
Please use the iLab system to schedule time to use this equipment.
