The MTI RTP OTF-1200X Rapid Thermal Processing Anneal Furnace is a compact rapid thermal processing tube furnace that is designed for annealing semiconductor wafers up to 1200°C.
Tube: 2” O.D. quartz tube
Maximum Temperature: 1200°C (<1 hour)
Continuous Working Temperature: 1100°C
Suggested Normal Heating Rate: ≤10°C /min
Maximum Heating Rate: 30°C /min
Constant Temperature zone: 4″ (+/-1°C) @ 1000°C
Please use the iLab system to schedule time to use this equipment.