Heidelberg MLA150 Maskless Lithography System

The Heidelberg MLA150 maskless lithography system is a direct laser writer for photolithography that enables fast prototyping without photomasks. The MLA 150 is a greyscale lithography system and has the capability to generate photomasks.

Laser wavelength: 375 nm
Minimum feature size:6 µm
Substrate size: 5 × 5 mm to 200 × 200 mm
Substrate thickness:1 mm to 12 mm
Photomask production capability: up to 8 inches
Accepted file formats: GDSII, DXF, CIS, Gerber
Photomask availability: 4″ and 5″ masks can be purchased from AggieFab staff

General Resources:

Heidelberg MLA150 Standard Operating Procedure

Heidelberg MLA150 Flyer

Laser Safety Classification at AggieFab

Resists Available at AggieFab for MLA150:

Resist	Typical Use
Shipley 1805	Thin positive photoresist
Shipley 1818	Standard positive photoresist
AZ 5214	Image reversal or positive tone
AZ nLOF 2000	Negative photoresist
AZ P4620	Thick positive photoresist (e.g., for DRIE)
LOR 3A	For bi-layer lift-off processing