
The Heidelberg MLA150 maskless lithography system is a direct laser writer for photolithography that enables fast prototyping without photomasks. The MLA 150 is a greyscale lithography system and has the capability to generate photomasks.
Laser wavelength: 375
Minimum feature size: 0.6 µm
Substrate size: 5X5 to 200X200 mm
Photomask production: up to 8 inch
Substrate thickness: 0.1 to 12 mm
Accepted file formats: GDSII , DXF, CIS, Gerber
4″ and 5″ photomasks may be purchased from AggieFab staff
Heidelberg MLA150 Standard Operating Procedure
The resist we recommend for DRIE is AZ P4620, which is provided by AggieFab. See the informative flyer here.
Please use iLab to reserve time on this equipment.