The Nordson March CS-1701 is a reactive ion etching (RIE) system that is excellent for silicide etching and anisotropic etching of nitrides, oxides and polyimides.
Wafer size: up to 6”
Power: 600 W maximum from a 13.56 MHz RF generator
Available gases: Ar, N2, O2, and CF4
Please use the iLab system to schedule time to use this equipment.
