The Nordson March CS-1701 RIE is a reactive ion etching (RIE) system that is excellent for silicide etching, anisotropic etching of nitrides, oxides and polyimides.
Installation Ongoing
Wafer size: up to 6”
Power: 600 W 13.56 MHz RF generator
Available gases: Ar, N2, O2, CF4
Please use the iLab system to schedule time to use this equipment.
