The Elionix ELS-BODEN 150 EBL is an ultra-high precision electron beam lithography system that uses leading edge technology to produce nanometer scale devices and structures. This tool comes with an Environmental Enclosure for temperature control. It also includes a Pre-Alignment Station and a Multiple Position Auto Loader for automatic batch processing.
E-beam column
- Min. line width: 4 nm
- Acceleration voltage: 150 kV
- Beam current: 5pA – 100 nA
- Beam diameter: 1.5 nm
- Beam position accuracy: 0.1 nm
- Max. field size: 500 µm
- Clock speed: 200 MHz
- SE & BSE detectors
Environmental enclosure
- Temperature control within 0.1°C/hour
- EMI field cancellation
Auto Loader
- Substrate size: up to 8” wafer
- Best Field stitching : ±10 nm
- Auto Loader
- 6 substrate holders
- Automatic batch processing
