The CEE X-Pro II Auto-Developer Workstation is equipped with the CEE Apogee 200 Spin Developer, which is a semi-automated, stand-alone system designed for precise and reproducible lithography development processes. These processes can be configured to dispense various developers, followed by an H2O rinse and N2 drying, providing complete dry-in/dry-out capability. The workstation features a HDPE spin bowl, ensuring broad chemical resistance and durability. Additionally, it includes an automatic drain separator and N2 purge system for efficient solvent handling and contamination control.
Substrate Sizes: 1/8″(4 mm) to 200 mm wafers and up to 6” X 6” photomasks
Available Developers: AZ400k1:4, MIF300, SU-8 developer, DI water
