The FEI HELIOS NANOLAB 460F1 Dual-Focused Ion Beam (FIB) is a DualBeam focused-ion beam (FIB) instrument capable of adding/removing materials at the nanometer scale and indicating the structure/composition. In AggieFab, it is tasked with nanomachining complex 3D structures using electron beam-induced deposition (EBID), ion milling and material manipulation. It is also used to prepare ultrathin samples for atomic scale analysis during transmission electron microscopy (TEM).
Simultaneous imaging of secondary electron (SE) and backscattered electron (BSE) signals
Resolution: 0.7nm @ 1kV, opt WD (SEM)
Resolution: 4.0nm @ 30 kV, coincident WD (FIB)
Integrated EasyLift nanomanipulator for in-situ manipulation
High throughput TEM prep recipes
SDD Energy Dispersive Spectroscopy (EDS) capable
Flipstage 3 for faster STEM imaging
Please use iLab to reserve this tool.
Helios SEM Standard Operating Procedure
Helios FIB Standard Operating Procedure
