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You are here: Home / Equipment / SUSS MA6 Mask Aligner for Photolithography

SUSS MA6 Mask Aligner for Photolithography

SUSS MA6 Mask Aligner for Photolithography

The SUSS MA6 is a mask aligner designed for high-resolution photolithography at the micrometer scale.

Wafer size: up to 4”

Mask size: up to 5”

Wavelength range: 350 – 450 nm

Exposure source: Hg lamp 350 W

Exposure contact: Soft, Hard, and Vacuum

Resolution: down to 1 µm

Alignment method: Top Side Alignment (TSA)

**Note** that AggieFab provides the following resists for use in the mask aligners: Shipley 1818, AZ 214, and AZ nLOF2000. AZ P4620 is also provided for DRIE applications. See informative flyers below.

AZ P4620 Flyer

AZ nLOF 2000 Flyer

AZ nLOF 2000 data package

AggieFab also provides the following developers and strippers:

TMAH 25% in water
AZ 400T stripper
AZ developer 1:1
AZ 300 MIF developer
AZ 726 MIF developer
MIBK/IPA developer
MIF-319 developer

Please use the iLab system to schedule time to use this equipment.

Suss MA-6 Mask Aligner Standard Operating Procedure

Primary Sidebar

Lithography/Patterning

Nanoscribe Photonics GT2 high-resolution 3D Printer Direct Laser Write Lithography

UpNano NanoOne 1000 US 2PP 3D printer

Heidelberg MLA150 Maskless Lithography System

EVG 610 Double-sided Mask Aligner

CEE X-Pro II Spin Coater

FEI Helios NanoLab 460F1 DualBeam Focused Ion Beam (FIB)

TESCAN MIRA3 E-beam Writer

Characterization

Woollam Alpha-SE Spectroscopic Ellipsometer

Bruker DektakXT Profiler

Evident LEXT Scanning Microscope​

Ocean Optics Film Measurement

Semiprobe Probe Station & Keithley Paramter Analyzer

4 Dimensions 4 Point Probe

Leica Reichert Polylite 88 Optical Microscope

Caltex 3D Microscope

Nikon Eclipse LV150N Optical Microscope

Bonding/Dicing

MPP Wire Bonder

Disco Hi-Tec Dicing Saw

EVG 501 Wafer Bonder

Deposition/Diffusion

Cressington Gold Sputter Coater

MTI RTP Anneal Furnace

Allwin21 AccuThermo AW610M RTP

Tystar LPCVD

Lesker PVD 75 E-Beam Evaporator 1

Lesker PVD 75 E-Beam Evaporator 2

Oxford Plasmalab 80 PECVD

Lesker PVD 75 DC Sputter

Lesker PVD 75 RF Sputter

Minibrutes Oxidation/Anneal Furnace

PDS 2010 Labcoter2 Parylene Deposition System

CLUSTEX 100sp Sputter

Plasma Etching

Tegal Asher

Nordson March CS 1701 RIE tool

Oxford Plasmalab 100 ICP RIE

Oxford Estrelas DRIE

Samco UV-1 UV-Ozone Cleaner

Rapid Prototyping

PLS6.120D Laser Engraver

Roland MDX-50 Benchtop CNC

EnvisionTech 3D Printers

Other Equipment

Laurell Spin Coater

Baxter Drying Ovens

Hot Plate Vacuum Chamber

Fume Hoods

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AggieFab Nanofabrication Facility (AggieFab)

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1617 Research Parkway
College Station, TX 77843

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Texas A&M University Department of Electrical and Computer Engineering
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