The Heidelberg MLA150 maskless lithography system is a direct laser writer for photolithography that enables fast prototyping without photomasks because it has the capability to generate photomasks.
The MLA 150 is a greyscale lithography system, and the specifications include:
– Laser wavelength: 375
– Minimum feature size: 0.6 µm
– Substrate size: 5X5 to 200X200 mm
– Photomask production: up to 8 inch
– Substrate thickness: 0.1 to 12 mm
– Accepted file formats: GDSII , DXF, CIS, Gerber
4″ and 5″ photomasks may be purchased from AggieFab staff
The Heidelberg MLA150 Flyer can be viewed here
The Heidelberg MLA150 standard operating procedure can be viewed here
The resist we recommend for DRIE is AZ P4620, which is provided by AggieFab. See the informative flyer here.
Please use iLab to reserve time on this equipment.
