The CEE X-Pro II Spin Coating Workstation is used for coating photoresist on samples with various sizes. This station comes equipped with two Apogee Spin Coaters, an Apogee Bake Plate, and an Apogee HMDS Bake Plate.
Spin Coater Features:
Sample size: Up to 8.0″ round and 7″x7″ square
Spin rate: up to 12,000 RPM
Spin speed repeatability: 0.2rpm (per standard spin module)
Programmable: Unlimited steps per recipe with data logging
Bake Plate Features:
Sample size: Up to 8″ round and 8″x8″ square
Max. Temperature: 300°C with 0.1°C resolution
Uniformity: ±0.3% across working surface
Programmable: Unlimited steps per recipe with data logging
Vapor HMDS Bake Plate Features:
Sample size: Up to 8″ round and 5″x5″ square
Max. Temperature: 150°C with 0.1°C resolution
Uniformity: ±0.3% across working surface
Programmable: Unlimited steps per recipe with data logging
CEE X-Pro II Workstation Standard Operating Procedure
CEE X-Pro II Workstation Flyer
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