The Tegal Plasmaline 421 is a dedicated resist asher.
– Sample configurations: Non-flat samples can be processed and large pieces may be run individually (in a horizontal configuration)
– Substrate materials: Silicon, III-V semiconductors, glass, and metal substrates may be processed; multiple wafers can be processed in a cassette
– RF power: 50-150 W
– Process gases: O2 and Ar
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