The Shellback Spin Rinse Dryer 820 is an automatic wafer rinsing and drying system. Each SRD has two chambers which can each fit a batch of 25 wafers allowing for very high throughput. This system allows users fast and safe wafer cleaning and drying.
- Substrate Size: 3″, 4″, 6″, and 8″ wafers
- Process Time: <8 minutes
- Particles: <20 adders @ 0.2um per 8″ wafer
