The Samco PD-220NL PECVD is a load lock, plasma enhanced chemical vapor deposition (PECVD) system capable of depositing high-quality amorphous Si, SiOx, SiNx, and SiOxNy. This tool has a wide range of applications including photonics structures, passivation layers, and hard masks.
Wafer size: up to 8”
Substrate Temperature: up to 450°C
Showehead Temperature: up to 200°C
Power: 300W Dual Frequency (13.56MHz+400kHz) RF generators
Available gases: SiH4, NH3, N2O, N2, O2, CF4, and TEOS
Coming Soon: Samco PD-220NL PECVD Plasmalab SOP
