Installation: 10/20 – early December 2025
Open to users: January 2026
The Elionix ELS-BODEN 150 EBL is an ultra-high precision electron beam lithography system that uses leading edge technology to produce nanometer scale devices and structures. This tool comes with an Environmental Enclosure for temperature control. It also includes a Pre-Alignment Station and a Multiple Position Auto Loader for automatic batch processing.
Sample Size: Small pieces to 8″ wafers
Source: Thermal Field Emission
Minimum Line Width: 4nm
Coming Soon (December 2025): Elionix EBL Standard Operating Procedure
