MTI D4
The MTI RTP is a compact rapid thermal processing tube furnace that is designed for annealing wafers coated with metallic films and metal samples up to 1000°C.
Tube: 4” O.D. quartz tube
Maximum Temperature: 1000°C (for <10/min)
Working Temperature: 400°C (continuous), 600°C (< 1 hour)
Suggested Normal Heating Rate: 10-25°C /sec
Maximum Heating Rate: 50°C /sec
Constant Temperature zone: 4″ (+/-1°C) @ 1000°C
Please use the iLab system to schedule time to use this equipment.
