EBE1
EBE2
The Lesker PVD 75 Electron Beam Evaporation tool is a metal thin film deposition system based on the electron beam evaporation technique. The ability to control the deposition rate, obtain a film with low contamination, and obtain very high deposition rates are the advantages of electron beam evaporation. There are two E-Beam tools at AggieFab labelled EBE1 and EBE2, each with different material restrictions.
- EBE1 Material Restrictions: Any materials on the approved materials list with EBE as the authorized equipment
- EBE2 Material Restrictions: Cr, Al, Ti, and Au only
- Provided pellets for ebeam deposition: Al, Cr, Cu, Ni, and Ti
- Deposition orientation: Evaporation Up
- Deposition sources: 4 pockets (multilayer deposition)
- Film thickness controller: Quartz Crystal Microbalance (QCM)
- Substrate size: up to 200 mm
- Substrate rotation: up to 20 rpm
Other materials can also be deposited in EBE1 and EBE2. Please review the list of approved materials to see if the material of interest is already allowed into AggieFab. If it is not, please forward the request for a new material to Sandra Malhotra ([email protected]), who will forward the request to the Material Review Board (MRB).
Lesker PVD 75 E-beam Evaporator Standard Operating Procedure
