Lithography/Patterning
Nanoscribe Photonics GT2 high-resolution 3D Printer Direct Laser Write Lithography
UpNano NanoOne 1000 US 2PP 3D printer
Heidelberg MLA150 Maskless Lithography System
EVG 610 Double-sided Mask Aligner
BIDTEC SP100 Spin Coater
FEI Helios NanoLab 460F1 DualBeam Focused Ion Beam (FIB)
TESCAN MIRA3 E-beam Writer
Characterization
Woollam Alpha-SE Spectroscopic Ellipsometer
Bruker DektakXT Profiler
Evident LEXT Scanning Microscope​
Ocean Optics Film Measurement
Micromanipulator 6100 Probe Station
4 Dimensions 4 Point Probe
Leica Reichert Polylite 88 Optical Microscope
Caltex 3D Microscope
Nikon Eclipse LV150N Optical Microscope
Bonding/Dicing
MPP Wire Bonder
Disco Hi-Tec Dicing Saw
EVG 501 Wafer Bonder
Deposition/Diffusion
Cressington Gold Sputter Coater
MTI RTP Anneal Furnace
Allwin21 AccuThermo AW610M RTP
Tystar LPCVD
Lesker PVD 75 E-Beam Evaporator 1
Lesker PVD 75 E-Beam Evaporator 2
Oxford Plasmalab 80 PECVD
Lesker PVD 75 DC Sputter
Lesker PVD 75 RF Sputter
Minibrutes Oxidation/Anneal Furnace
PDS 2010 Labcoter2 Parylene Deposition System
CLUSTEX 100sp Sputter
Plasma Etching
Tegal Asher
Nordson March CS 1701 RIE tool
Oxford Plasmalab 100 ICP RIE
Oxford Estrelas DRIE
Rapid Prototyping
PLS6.120D Laser Engraver
Roland MDX-50 Benchtop CNC
EnvisionTech 3D Printers
Other Equipment
Laurell Spin Coater
Baxter Drying Ovens
Hot Plate Vacuum Chamber
Fume Hoods