Lithography/Patterning
Nanoscribe Photonics GT2 high-resolution 3D Printer Direct Laser Write Lithography
UpNano NanoOne 1000 US 2PP 3D printer
Heidelberg MLA150 Maskless Lithography System
EVG 610 Double-sided Mask Aligner
CEE X-Pro II Spin Coater
FEI Helios NanoLab 460F1 DualBeam Focused Ion Beam (FIB)
TESCAN MIRA3 E-beam Writer
Characterization
Woollam Alpha-SE Spectroscopic Ellipsometer
Bruker DektakXT Profiler
Evident LEXT Scanning Microscope​
Ocean Optics Film Measurement
Semiprobe Probe Station & Keithley Paramter Analyzer
4 Dimensions 4 Point Probe
Caltex 3D Microscope
Nikon Eclipse LV150N Optical Microscope
Bonding/Dicing
MPP Wire Bonder
Disco Hi-Tec Dicing Saw
EVG 501 Wafer Bonder
Deposition/Diffusion
Cressington Gold Sputter Coater
CN1 Atomic Premium PEALD
CN1 Atomic Premium Thermal ALD
MTI RTP Anneal Furnace
Allwin21 AccuThermo AW610M RTP
Tystar LPCVD
Lesker PVD 75 E-Beam Evaporator 1
Lesker PVD 75 E-Beam Evaporator 2
Oxford Plasmalab 80 PECVD
Lesker PVD 75 DC Sputter
Lesker PVD 75 RF Sputter
Minibrutes Oxidation/Anneal Furnace
PDS 2010 Labcoter2 Parylene Deposition System
CLUSTEX 100sp Sputter
Plasma Etching
Nordson March CS 1701 RIE tool
Oxford Plasmalab 100 ICP RIE
Oxford Estrelas DRIE
Samco UV-1 UV-Ozone Cleaner
Diener Plasma Cleaner
Rapid Prototyping
PLS6.120D Laser Engraver
Roland MDX-50 Benchtop CNC
EnvisionTech 3D Printers
Other Equipment
Laurell Spin Coater
Baxter Drying Ovens
Hot Plate Vacuum Chamber
Fume Hoods